Title:
METHOD AND MECHANISM FOR MEASURING SAMPLE POSITION IN ELECTRON-BEAM LITHOGRAPHY APPARATUS
Document Type and Number:
Japanese Patent JPS5929419
Kind Code:
A
Abstract:
PURPOSE:To make it possible to measure a true position of a sample with respect to an electron-beam lens barrel, by compensating for the amount of change due to thermal deformation using two laser interferometers. CONSTITUTION:A laser beam 12C upwardly split by a beam splitter B14 passes through a laser interferometer A31 and strikes on a laser mirror A18 secured to the lower surface of an electron-beam lens barrel 17 on the lateral center line thereof. The laser beam 12C reflected by the laser mirror A18 passes through the laser interferometer A31 to reach a laser receiver 19. Thus, the amount of change in the distance between the laser interferometer A31 and the laser mirror A18 is measured. On the other hand, a laser beam 12D rightwardly split by the beam splitter B14 is upwardly directed by a beam bender 15 to pass through a laser interferometer B31 and strike on a laser mirror B22 secured to a stage 21. The laser beam 12D reflected by the mirror B22 passes through the laser interferometer B31 to reach the laser receiver 19. Thus, the movement distance between the laser interferometer B31 and the laser mirror B22 is measured. It is thereby possible to measure a correct position of a sample, even if a sample chamber rises in temperature, by previously measuring the amount of change in the distance between the laser interferometer and the reference surface, and compensating for a variation when the movement distance of the sample is measured.
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Inventors:
NUMAGA TAKUOKI
Application Number:
JP14002782A
Publication Date:
February 16, 1984
Filing Date:
August 12, 1982
Export Citation:
Assignee:
TOSHIBA MACHINE CO LTD
International Classes:
H01L21/027; H01J37/304; H01J37/34; (IPC1-7): H01L21/30