Title:
METHOD FOR MODIFYING DEFECTIVE PART OF HALFTONE PHASE SHIFTING MASK
Document Type and Number:
Japanese Patent JP2003121988
Kind Code:
A
Abstract:
To provide a method for modifying the surplus defective part of a halftone phase shifting mask by which the harmful effect of a glass part which remains under the surplus defective part without being etched can be eliminated by a relatively simple process.
The surplus defective part 6 of a translucent film in a halftone phase shifting mask is removed by modification, and only a part 7 of a transparent substrate situated under the modified part is etched simultaneously with the removal.
Inventors:
SUDA HIDEKI
Application Number:
JP2001315111A
Publication Date:
April 23, 2003
Filing Date:
October 12, 2001
Export Citation:
Assignee:
HOYA CORP
International Classes:
G03F1/32; G03F1/68; G03F1/72; G03F1/74; H01L21/027; (IPC1-7): G03F1/08; H01L21/027
Attorney, Agent or Firm:
Yasuo Fujimura
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