Title:
METHOD FOR PRODUCING THIN FILM OF LIQUID-CRYSTALLINE BLOCK COPOLYMER, AND METHOD FOR FORMING PATTERN
Document Type and Number:
Japanese Patent JP2015113356
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a method for producing a thin film of a liquid-crystalline block copolymer, which enables stable production of a thin film of a liquid-crystalline block copolymer of good quality, the liquid-crystalline block copolymer having a microphase-separated structure with a uniaxially horizontally oriented nano pattern.SOLUTION: The method for producing a thin film of a liquid-crystalline block copolymer comprises the steps of: drawing a line on a substrate by discharging by an inkjet method a solution containing a liquid-crystalline block copolymer (I) having a liquid-crystalline block chain (A) and a block chain (B) which is incompatible with the liquid-crystalline block chain (A); encapsulating the substrate surface on which the line was drawn with a hydrophobic material which is incompatible with both of the block chain (A) and the block chain (B); heat-treating the substrate; and removing the hydrophobic material. A cross-section of the line in a vertical direction thereof has a shape having a curvature of 0.03 to 0.29 (μm).
Inventors:
IYODA TOMOKAZU
KOMURA MOTONORI
SATO HIROYUKI
MASUDA KAZUYUKI
MURATA KAZUHIRO
KOMURA MOTONORI
SATO HIROYUKI
MASUDA KAZUYUKI
MURATA KAZUHIRO
Application Number:
JP2013254279A
Publication Date:
June 22, 2015
Filing Date:
December 09, 2013
Export Citation:
Assignee:
TOKYO INST TECH
SIJTECHNOLOGY INC
SIJTECHNOLOGY INC
International Classes:
C08J5/18; C08F4/32; C08F20/26; C08F20/34
Domestic Patent References:
| JP2012233138A | 2012-11-29 | |||
| JP2010279880A | 2010-12-16 | |||
| JP2004124088A | 2004-04-22 | |||
| JP2013163755A | 2013-08-22 | |||
| JP2012233138A | 2012-11-29 | |||
| JP2010279880A | 2010-12-16 | |||
| JP2004124088A | 2004-04-22 | |||
| JP2013163755A | 2013-08-22 |
Attorney, Agent or Firm:
Takeshi Sekine
Atsushi Watanabe
Atsushi Watanabe