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Title:
METHOD FOR REGENERATING SPENT DEVELOPER
Document Type and Number:
Japanese Patent JP2001212596
Kind Code:
A
Abstract:

To provide a method for regenerating spent developer to obtain a regenerated developer of high purity.

Spent developer is electrdialyzed and subjected to a mixed bed ion-exchange apparatus to remove a photoresist by anion exchange and metal ions by cation exchange. After that, liquid quality is confirmed by a liquid quality confirmation device 1, and the liquid is measured by an absorptiometer to know whether the concentration of the photoresist is below a standard or not. When the concentration meets the standard, the liquid is subjected to membrane dialysis and treated further with active carbon, and the liquid quality is confirmed by a liquid quality confirmation device 2. When the concentration of the photoresist meets the standard, the liquid is sent to a concentration adjusting device, and the regenerated developer having a precision bearable to development operation is obtained only by adding water. The liquid whose photoresist concentration measured by the device 1 or the device 2 exceeds the standard is returned from the confirmation device to a previous process through a passage T1 or a passage T2 to be treated again.


Inventors:
YAMAGUCHI NORIO
IGARASHI NORIO
SHIMIZU KOJI
Application Number:
JP2000026493A
Publication Date:
August 07, 2001
Filing Date:
February 03, 2000
Export Citation:
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Assignee:
MATSUSHITA ENV AIRCOND ENG CO
International Classes:
B01D15/04; C02F1/28; C02F1/42; C02F1/469; C02F9/00; G03F7/32; (IPC1-7): C02F9/00; B01D15/04; C02F1/42; C02F1/469; G03F7/32
Attorney, Agent or Firm:
Hidehiko Okada (3 others)