Title:
METHOD FOR REMOVING NA ION FROM PHOTORESIST REMOVER
Document Type and Number:
Japanese Patent JP3029571
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To very efficiently reduce the concn. of Na ions in a photoresist remover.
SOLUTION: A photoresist remover made of or based on at least one of an alkylamine and a polar org. solvent is treated with Sb2O5.nH2O (1≤n≤4) which is antimony pentoxide hydrate to reduce the concn. of Na ions in the photoresist remover. This treatment is carried out by adding the Sb2O5.nH2O (1≤n≤4) to the photoresist remover or bringing the photoresist remover into contact with the Sb2O5.nH2O (1≤n≤4).
Inventors:
Yoshitaka Nishijima
Takeshi Kotani
Takeshi Kotani
Application Number:
JP17854196A
Publication Date:
April 04, 2000
Filing Date:
June 18, 1996
Export Citation:
Assignee:
Nagase Electronic Chemical Co., Ltd.
International Classes:
G03F7/42; B01J39/02; C02F1/42; C09K3/00; C22B26/10; C23F1/00; H01L21/027; H01L21/308; (IPC1-7): G03F7/42; B01J39/02; C02F1/42; C09K3/00; C22B26/10; C23F1/00; H01L21/027; H01L21/308
Domestic Patent References:
| JP6472155A | ||||
| JP5319830A | ||||
| JP8505241A |
Attorney, Agent or Firm:
Shinichi Shiode (1 person outside)
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