Title:
METHOD FOR TREATING TERMINAL OF HOLLOW SUBSTRATE AND TERMINAL STRUCTURE OF HOLLOW SUBSTRATE
Document Type and Number:
Japanese Patent JP3759725
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To finish the terminal of a hollow substrate, wherein many hollow parts are formed between front and rear liners by providing vertical wall forming members for forming vertical walls between the front and rear liners, so as to make the same look more attractive without forming burr and applying post treatment.
SOLUTION: In this method for treating the terminal of the hollow substrate, first, a heating plate 8 is inserted in the gap between the front and rear liners 1a and 1b of the hollow substrate 5 from the outside in parallel to those liners and pushed in the hollow substrate 5 while softening/melting the vertical wall forming members 2. Next, the terminal parts, which are removed by pushing in the vertical wall forming members 2, of the liners 1a and 1b are bent along the end edges of the liners of the liners 1a and 1b by bending fixtures 7a and 7b to cover the end edges with the terminal parts of the liners 1a and 1b.
Inventors:
Yuji Fujii
Application Number:
JP2002349872A
Publication Date:
March 29, 2006
Filing Date:
December 02, 2002
Export Citation:
Assignee:
Hayashi Institute of Technology Co., Ltd.
International Classes:
B32B3/28; B29C53/36; B29L22/00; (IPC1-7): B32B3/28
Domestic Patent References:
| JP2001018308A | ||||
| JP2000158530A | ||||
| JP51125595A | ||||
| JP6278203A | ||||
| JP5124140A |
Attorney, Agent or Firm:
Akio Miyazaki
Nobuyuki Kaneda
Katsuhiro Ito
Ishibashi Masayuki
Nobuyuki Kaneda
Katsuhiro Ito
Ishibashi Masayuki
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