Title:
貫通孔を有するシートの製造方法とミクロン及びサブミクロンフィルターの製造におけるその使用
Document Type and Number:
Japanese Patent JP4049745
Kind Code:
B2
Abstract:
The method comprises the following steps: preparing a sheet having thickness of 5 mum to a few tens of micrometers, suitable for being etched by a lithographic operation; making a mask on a face of the sheet, the mask presenting etching selectivity S of at least 5; depositing a layer of photosensitive resin on the mask; making through holes in the layer of resin by photolithography; etching through the mask via the pores in the layer of resin; and anisotropically etching through the sheet from the pores in the mask in order to make pores in the sheet having an aspect ratio greater than 5. The invention is applicable to fabricating micron and sub-micron filters.
Inventors:
Lagard, Chilly
Peltier, Jack
Lacoste, Anna
Arnal, Eve, Alban-Marie
Peltier, Jack
Lacoste, Anna
Arnal, Eve, Alban-Marie
Application Number:
JP2003557702A
Publication Date:
February 20, 2008
Filing Date:
January 07, 2003
Export Citation:
Assignee:
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS)
International Classes:
B01D39/16; B01D67/00; B01D69/02; B01D69/06; B01D71/02; G03F7/00
Domestic Patent References:
| JP7501988A | ||||
| JP11276867A | ||||
| JP61064303A | ||||
| JP62129106A |
Foreign References:
| WO2001041905A1 |
Attorney, Agent or Firm:
Tadashi Sato
Toshiya Sato
Toshiya Sato