Title:
MICROPHASE SEPARATION STRUCTURE ON FLEXIBLE SUBSTRATE, AND METHOD OF MANUFACTURING THE SAME
Document Type and Number:
Japanese Patent JP2010058314
Kind Code:
A
Abstract:
To provide a structure having a layer of a block copolymer with a microphase separation structure in which a cylindrical or lamella-like phase is oriented in the direction vertical to a flexible substrate such as a polymer substrate, and to provide a method of manufacturing the structure.
The structure 10 includes a metallic layer 16, a metal-adsorbent compound layer 18, and the layer 20 of the block copolymer having the microphase separation structure prepared by bonding two or more kinds of polymer chains insoluble in each other, these layers being formed in this order on the flexible substrate 14. One phase of the microphase separation structure is cylindrical or lamella-like, and is oriented in the direction vertical to the substrate.
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Inventors:
ISHIZUKA KENICHI
NISHIMI TAISEI
NISHIMI TAISEI
Application Number:
JP2008224635A
Publication Date:
March 18, 2010
Filing Date:
September 02, 2008
Export Citation:
Assignee:
FUJIFILM CORP
International Classes:
B32B15/08; B32B7/03; B82B1/00
Attorney, Agent or Firm:
Nozomi Watanabe
Haruko Sanwa
Haruko Sanwa
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