Title:
TARGET FOR SPUTTERING AND ITS PRODUCTION
Document Type and Number:
Japanese Patent JPH0649632
Kind Code:
A
Abstract:
PURPOSE: To produce a target for sputtering capable of stably and continuously forming protective films having a low refractive index and a low absorption coefft. in a visible region as optical characteristics and excellent in wear resistance and chemical stability by DC sputtering over a long time.
CONSTITUTION: A powdery mixture of SiC powder with at least one of ZrC and ZrN powders as a powdery Zr compd. is sintered by heating to produce the objective target 4 for sputtering made of a sintered compact based on SiC and at least. one of ZrC and ZrN.
Inventors:
KONISHI MIKIRO
MORIOKA TARO
MORIOKA TARO
Application Number:
JP2029492A
Publication Date:
February 22, 1994
Filing Date:
February 05, 1992
Export Citation:
Assignee:
SUMITOMO CEMENT CO
International Classes:
C23C14/34; (IPC1-7): C23C14/34
Attorney, Agent or Firm:
Masatake Shiga (2 outside)
Next Patent: SPUTTERING DEVICE