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Patent Searching and Data


Title:
METHOD AND DEVICE FOR SEMICONDUCTOR ELEMENT SIMULATION
Document Type and Number:
Japanese Patent JPH0668064
Kind Code:
A
Abstract:

PURPOSE: To perform one-dimensional simulation in a shirt time with a high precision.

CONSTITUTION: This device consists of an initial value input part 1 which inputs an initial physical quantity at the time of estimating the influence upon a one- dimensional simulation area of the multidimensional effect obtained from a two-dimensional area, a two-dimensional effect estimating part 2 which uses the inputted initial physical quantity to estimate the influence, a one-dimensional simulation executing part 3 which determines the variation of a simulation parameter in the one-dimensional simulation area based on the estimated influence and physical relations between the two-dimensional area and the one- dimensional simulation area and executes one-dimensional simulation, and a physical quantity determining part 4 which determines the physical quantity on the one-dimensional simulation area in accordance with the one-dimensional simulation result. Thus, the design efficiency of a semiconductor element is improved.


Inventors:
AOKI NOBUTOSHI
KANEMURA TAKANAGA
AMAKAWA HIROTAKA
Application Number:
JP22157892A
Publication Date:
March 11, 1994
Filing Date:
August 20, 1992
Export Citation:
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Assignee:
TOSHIBA CORP
International Classes:
H01L29/00; G06F17/00; G06F17/50; G06F19/00; H01L21/336; H01L29/78; (IPC1-7): G06F15/20; G06F15/60; H01L29/00
Attorney, Agent or Firm:
Hidekazu Miyoshi (1 outside)