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Title:
POLY@(3754/24)3-METHYL-4-HYDROXYSTYRENE) AND ITS PRODUCTION
Document Type and Number:
Japanese Patent JPH0641221
Kind Code:
A
Abstract:

PURPOSE: To obtain the polymer excellent as a polymer for a resist material having a high resolution and suitable for a polymer blend by subjecting 3- methyl-4-t-butoxystyrene to living anionic polymn. and separating the t-butoxy groups from the resulting polymer.

CONSTITUTION: 3-Methyl-4-t-butoxystyrene of formula I is subjected to living anionic polymn. pref. using an organometallic compd. such as n-butyllithium as a polymn. initiator pref. in an org. solvent such as tetrahydrofuran. The resulting polymer, poly(3-methyl-4-t-butoxystyrene), is dissolved in a solvent such as acetone to give a soln., to which an acid such as hydrochloric acid is added dropwise to separate the t-butoxy groups from the polymer, giving a monodisperse poly(3-methyl-4-hydroxystyrene) having repeating units of formula II.


Inventors:
WATANABE OSAMU
YAMADA MOTOYUKI
Application Number:
JP21635892A
Publication Date:
February 15, 1994
Filing Date:
July 22, 1992
Export Citation:
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Assignee:
SHINETSU CHEMICAL CO
International Classes:
C08F8/12; C08F12/00; C08F12/24; G03F7/027; G03F7/038; H01L21/027; (IPC1-7): C08F8/12; C08F12/24; G03F7/027; G03F7/038; H01L21/027
Attorney, Agent or Firm:
Kiyoaki Takita