Title:
COATING DEVICE
Document Type and Number:
Japanese Patent JPH0576814
Kind Code:
A
Abstract:
PURPOSE: To provide a coating device which can carry out the secure cleaning all the time without varying the relative positioning relation between the rear face of a material to be coated and a cleaning nozzle.
CONSTITUTION: The rear face of a wafer 1 is supported by a rotatable spin chuck 10, and resist liquid is dropped from a resist nozzle 30 while the wafer 1 is rotated to spin coat with the resist liquid. A flange 21 for mounting a motor 20 is arranged on a position facing the rear face of said wafer 1, and a rear face cleaning nozzle 50 for cleaning the rear face of the wafer 1 after spin coating is supported on the flange 21.
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Inventors:
MORIYAMA MASASHI
Application Number:
JP5896292A
Publication Date:
March 30, 1993
Filing Date:
February 10, 1992
Export Citation:
Assignee:
TOKYO ELECTRON LTD
International Classes:
B05C11/08; B05D1/40; G03F7/16; H01L21/027; H01L21/304; G11B5/842; (IPC1-7): B05C11/08; G03F7/16; H01L21/027; H01L21/304
Domestic Patent References:
| JPS60142517A | 1985-07-27 | |||
| JPS55165170A | 1980-12-23 | |||
| JP51172306A | ||||
| JPS60234321A | 1985-11-21 |
Attorney, Agent or Firm:
Hajime Inoue (2 outside)