COMPOSITE TARGET FOR MAGNETRON SPUTTERING

Title:

COMPOSITE TARGET FOR MAGNETRON SPUTTERING

Document Type and Number:

Japanese Patent JPH0711432

Kind Code:

A

Abstract:

PURPOSE: To reduce a cost of magnetron sputtering film formation using an expensive target contg. Pt, etc., as the magnetic film material of a magnetic recording medium, etc., by improving the utilization efficiency of the target.

CONSTITUTION: This target consists of a target main body 10 having a chemical composition corresponding to a thin film to be formed and a backing plate 20 to fix the main body. The main body 10 is annularly shaped along a region (erosion position) on the target surface where a sputtering discharge is generated and fixed in an annular groove 21 formed on the surface of the backing plate 20. A triangular cross section with the apex protruding toward the rear is given, as required, to the main body 10.

Inventors:

ENDO ISAO
YASUI MASAHIKO
FUNAKOSHI ATSUSHI
NISHI TAKASHI

Application Number:

JP17747293A

Publication Date:

January 13, 1995

Filing Date:

June 23, 1993

Export Citation:

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Assignee:

KUBOTA KK

International Classes:

C23C14/34; G11B5/85; G11B5/851; H01F41/18; (IPC1-7): C23C14/34; G11B5/85; H01F41/18

Attorney, Agent or Firm:

Miyazaki Shinhachiro

Next Patent: 自動車用シートスライド装置