Title:
NANOSTRUCTURE AND ITS MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2005212093
Kind Code:
A
Abstract:
To highly accurately control sizes of nanoparticles and the arrangement positions in a nanostructure.
In this manufacturing method, a thin film 10 including vector polymer 16 having a payload part is formed on a substrate 12. The thin film 10 is formed in a pattern. An organic component of the thin film 10 formed in the pattern is removed to form the nanoparticles 34 including the payload.
Inventors:
MOLL NICOLAS J
ROITMAN DANIEL B
LU JENNIFER Q
ROITMAN DANIEL B
LU JENNIFER Q
Application Number:
JP2005015636A
Publication Date:
August 11, 2005
Filing Date:
January 24, 2005
Export Citation:
Assignee:
AGILENT TECHNOLOGIES INC
International Classes:
G03F7/11; B82B3/00; C01B31/02; C08L101/00; G03F7/40; H01L51/30; (IPC1-7): B82B3/00; C08L101/00; G03F7/11; G03F7/40
Attorney, Agent or Firm:
Satoshi Furuya
Takahiko Mizobe
Kiyoharu Nishiyama
Takahiko Mizobe
Kiyoharu Nishiyama
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