Title:
NEGATIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION AND NEGATIVE PATTERN FORMING METHOD
Document Type and Number:
Japanese Patent JPH06148886
Kind Code:
A
Abstract:
PURPOSE: To form a high sensitivity and high resolution negative type pattern withstanding practical use by incorporating a specified nitrophenyldihydroxypyridine deriv. as a photosensitive substance as well as an alkali-soluble polymer.
CONSTITUTION: A 4-(2'-nitrophenyl)-1,4-dihydroxypyridine deriv. represented by the formula and an alkali-soluble polymer other than a precursor of polyimide are incorporated. In the formula, each of R3 and R4 is H or 1-8C alkyl, each of R5 and R6 is 1-4C alkyl, 1-4C alkoxyl, anilino, toluidino, benzyloxy, amino or dialkylamino, each of X1-X4 is H, F, nitro, methoxy, dialkylamino, amino, cyano or fluoroalkyl and R3 and R5 or R4 and R6 may form a keto-contg. 5- or 6-membered ring or a hetero ring.
Inventors:
OMOTE TOSHIHIKO
HAYASHI SHUNICHI
KOKURYO AKIHIKO
HAYASHI SHUNICHI
KOKURYO AKIHIKO
Application Number:
JP29443392A
Publication Date:
May 27, 1994
Filing Date:
November 02, 1992
Export Citation:
Assignee:
NITTO DENKO CORP
International Classes:
G03F7/004; G03F7/038; G03F7/38; H01L21/027; H01L21/30; (IPC1-7): G03F7/038; G03F7/004; G03F7/38; H01L21/027
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