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Title:
NEW ACTINIC RADIATION-CURABLE INK COMPOSITION
Document Type and Number:
Japanese Patent JPH04272967
Kind Code:
A
Abstract:

PURPOSE: To obtain a highly sensitive, actinic radiation-curable ink composition excellent in curability, acid resistance, solvent resistance and heat resistance by mixing an actinic radiation-curable resin of a specified composition with a photopolymerization initiator as essential components.

CONSTITUTION: An oxirane compound of formula I (wherein W, X, Y and Z are each H or a group of formula II) is reacted with a compound having both a group reactive with the oxirane group and a double bond, a compound having both a group reactive with an active hydroxyl group and a double bond, and a compound having a group reactive with an active hydroxyl group to produce an actinic radiation-curable resin. This resin is mixed with a photopolymerization initiator (e.g. benzoyl isopropyl ether) as essential components to produce an actinic radiation-curable ink composition. This ink composition can be desirably used for solder resists, etching resists, etc.


Inventors:
KINOSHITA MASAYUKI
ISHIKAWA HIDENORI
Application Number:
JP3276691A
Publication Date:
September 29, 1992
Filing Date:
February 27, 1991
Export Citation:
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Assignee:
DAINIPPON INK & CHEMICALS
International Classes:
C08G59/18; C08G59/00; C08G59/20; C08G59/40; C08G59/42; C09D11/00; C09D11/033; C09D11/10; C09D11/101; C09D11/102; C09D11/106; (IPC1-7): C08G59/18; C08G59/20; C08G59/42; C09D11/00; C09D11/10
Attorney, Agent or Firm:
Takahashi victory



 
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