Title:
新規化合物、該化合物を含んでなる光重合開始剤及び該光重合開始剤を含有する感光性樹脂組成物
Document Type and Number:
Japanese Patent JP7218073
Kind Code:
B2
Abstract:
This compound, which absorbs long-wavelength active energy rays and generates with high-efficiency radicals and strong bases, and which has excellent reaction efficiency in a base generating chain reaction, is represented by formula (1), where, in formula (1), R1, R2, R3, R5 and R6 independently represent a hydroxy group, an alkoxy group, or an organic group other than those substituents, the R4's independently represent an organic group including a thioether bond, and ‘A’ represents a substituent represented by formula (1-1) or (1-2), where, in formula (1-1), R7 and R8 independently represent a hydrogen atom, an alkyl group or a heterocyclic group, and where, in formula (1-2), R9 and R10 independently represent an amino group or a substituted amino group. A photopolymerization initiator can include said compound; and a photosensitive resin composition can include said photopolymerization initiator.
Inventors:
Satoshi Terada
Hirokazu Kuwahara
Hirokazu Kuwahara
Application Number:
JP2020503607A
Publication Date:
February 06, 2023
Filing Date:
February 28, 2019
Export Citation:
Assignee:
NIPPON KAYAKU KABUSHIKI KAISHA
International Classes:
C07C323/22; C07D213/75; C07D213/85; C07D295/205; C08F2/50; C08G77/08
Domestic Patent References:
| JP2012180310A | ||||
| JP2011190241A | ||||
| JP2019052268A | ||||
| JP2019066779A |
Foreign References:
| WO2017099130A1 | ||||
| KR1020130066483A | ||||
| KR1020060053095A | ||||
| WO1997031033A1 | ||||
| WO2017141723A1 | ||||
| WO2018207836A1 | ||||
| WO2019168113A1 |
Other References:
寺田 究 他,アミンとラジカルを発生するベンゾイン誘導体を光塩基発生剤として用いたUVハードコート材料,高分子学会予稿集,Vol.66, No.2,2017年,3X03,Scheme 1,2、2.実験
寺田 究 他,アミンとラジカルを発生する光塩基発生剤の開発とハードコート材料への応用,高分子学会予稿集,Vol.66, No.1,2017年,1G06,Scheme 1,2、Fig1,2、2.実験
ISHIKAWA, N. et al.,Photosensitivity Characteristics of UV Curable Organic-Inorganic Hybrids Sensitized with Benzoin Derivatives as Photobase Generators,Journal of Photopolymer Science and Technology,2014年,Vol.27, No.2,pp.223-225,Scheme 1
ISHIKAWA, N. et al.,Development of Photobase Generator with Benzoin Derivatives and Its Application to Photosensitive Materials,Chemistry Letters,2014年,Vol.43, No.5,pp.612-614,Scheme 1, 2
有光 晃二 他,塩基増殖基を有する光塩基発生剤の合成とネガ型フォトポリマーへの応用,高分子論文集,2014年,Vol.71, No.2,pp.53-58,Scheme 1,2
ZHANG, X. et al.,Visible-Light-Initiated Thiol-Michael Addition Polymerizations with Coumarin-Based Photobase Generators: Another Photoclick Reaction Strategy,ACS Macro Letters,2016年,Vol.5,pp.229-233,Scheme 1
寺田 究 他,アミンとラジカルを発生する光塩基発生剤の開発とハードコート材料への応用,高分子学会予稿集,Vol.66, No.1,2017年,1G06,Scheme 1,2、Fig1,2、2.実験
ISHIKAWA, N. et al.,Photosensitivity Characteristics of UV Curable Organic-Inorganic Hybrids Sensitized with Benzoin Derivatives as Photobase Generators,Journal of Photopolymer Science and Technology,2014年,Vol.27, No.2,pp.223-225,Scheme 1
ISHIKAWA, N. et al.,Development of Photobase Generator with Benzoin Derivatives and Its Application to Photosensitive Materials,Chemistry Letters,2014年,Vol.43, No.5,pp.612-614,Scheme 1, 2
有光 晃二 他,塩基増殖基を有する光塩基発生剤の合成とネガ型フォトポリマーへの応用,高分子論文集,2014年,Vol.71, No.2,pp.53-58,Scheme 1,2
ZHANG, X. et al.,Visible-Light-Initiated Thiol-Michael Addition Polymerizations with Coumarin-Based Photobase Generators: Another Photoclick Reaction Strategy,ACS Macro Letters,2016年,Vol.5,pp.229-233,Scheme 1
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