To provide an optical disk master disk exposure device which absorbs vibration in a feed direction associated with the rotation of an optical disk master disk, and exposes the track of the master disk with high accuracy.

The optical disk master disk exposure device 1 moves an exposure object lens 25 in the radial direction of a resist master disk 70 to converge exposure light on the master disk 70, while rotationally driving a turntable 12 on which the master disk 70 is placed, and exposes the master disk 70 to light at a constant pitch. Vibrational displacement in the radial direction of the master disk 70 on the turntable 12 is measured by a displacement sensor 30, and the position in the radial direction of the master disk 70 on the object lens 25 for exposure is controlled on the basis of the measured results. Accordingly, a pitch fluctuation during narrow track exposure is reduced, exposure quality can be improved, thereby the exposure device can be applied to a next- generation exposure device, and can expose inexpensively and with high accuracy.