Title:
光学フィルタの製造装置
Document Type and Number:
Japanese Patent JP5774221
Kind Code:
B2
Abstract:
A mask and an optical filter manufacturing apparatus including the same are provided. A mask used for a roll-to-roll process of forming patterns in a base film configured to move along a curved surface includes a mask body having a curved surface disposed opposite a roll around which the base film is wound and a plane surface corresponding to the reverse side of the curved surface. The curved surface of the mask body is disposed a predetermined distance apart from a curved surface of the roll. The mask and optical filter manufacturing apparatus enable formation of uniform patterns on the base film to enhance the quality of products and precisely attain the properties of the base film.
Inventors:
Shin, Bgon
Kim, Shin Yang
Kim, Jin
Lee, Dami
Kim, Shin Yang
Kim, Jin
Lee, Dami
Application Number:
JP2014521570A
Publication Date:
September 09, 2015
Filing Date:
July 23, 2012
Export Citation:
Assignee:
LG HAUSYS,LTD.
International Classes:
G03F1/00; G02B5/30; G03F1/54; G03F1/60; G03F7/20
Domestic Patent References:
JP2000241647A | ||||
JP2160237A | ||||
JP8095231A | ||||
JP8222497A | ||||
JP2010276998A | ||||
JP2006126464A | ||||
JP2009265290A | ||||
JP2011069994A | ||||
JP2006201538A | ||||
JP2010060681A | ||||
JP2004006849A |
Foreign References:
WO2012044077A2 |
Attorney, Agent or Firm:
Longhua International Patent Service Corporation