有機金属化合物およびこれを用いた薄膜

Title:

有機金属化合物およびこれを用いた薄膜

Document Type and Number:

Japanese Patent JP6999830

Kind Code:

B2

Abstract:

According to the organometallic compound of the present invention and the thin film manufactured using the same, requirements of high volatility and excellent chemical/thermal stability are satisfied, and significantly improved thin-film deposition rates are exhibited even at low temperatures. In addition, property degradation due to by-products can be improved, excellent step coverage can be realized, and a thin film which, due to having a high dielectric constant, electrically satisfies the equivalent oxide thickness (EOT) requirement while having a thickness at which tunneling does not physically occur can be implemented.

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Inventors:

Sun Won Ha
Young Hoon Pyeong
Jom John Kim
Ho Hung Kim
Song Hak Chung

Application Number:

JP2020542899A

Publication Date:

February 04, 2022

Filing Date:

January 25, 2019

Export Citation:

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Assignee:

MECARO CO.,LTD.

International Classes:

C07F9/00; C07F9/6596; H01L21/31; H01L21/316

Domestic Patent References:

JP2012505177A
JP2014510733A

Foreign References:

KR1020130049020A
WO2017179857A1
WO2018048124A1

Attorney, Agent or Firm:

Axis International Patent Business Corporation

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