Title:
【発明の名称】CVD装置の残留ガス除去方法
Document Type and Number:
Japanese Patent JP2708533
Kind Code:
B2
Abstract:
A CVD method comprises the steps of making a plasma self-cleaning within a chamber (2) using a gas which includes fluorine, coating an inside of the chamber by a first layer of a material which includes silicon and nitrogen, and forming a second layer on a predetermined surface within the chamber by a chemical vapor deposition. The second layer is made of a material which includes a quantity of nitrogen smaller than a quantity of nitrogen included in the first layer.
Inventors:
Atsuhiro Tsukune
Kenji Koyama
Kenji Koyama
Application Number:
JP6150889A
Publication Date:
February 04, 1998
Filing Date:
March 14, 1989
Export Citation:
Assignee:
富士通株式会社
International Classes:
C23C16/30; C23C16/44; C23C16/50; H01L21/205; H01L21/302; H01L21/3065; H01L21/31; (IPC1-7): C23C16/44; C23C16/50; H01L21/205; H01L21/31
Attorney, Agent or Firm:
Fumihiro Hasegawa (2 outside)