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Patent Searching and Data


Title:
PATTERN FORMING MATERIAL AND PATTERN FORMING METHOD
Document Type and Number:
Japanese Patent JPH10282667
Kind Code:
A
Abstract:

To obtain a material which is made transparent in a far UV region and has high resistance against dry etching and solubility in water-based alkali by incorporating a resin soluble in a water-based alkali, an acid-producing compd. and a compd. having reactivity to decrease solubility of a coating film in an alkaline soln. by acid catalyst reaction.

The pattern forming mateal contains an alkali-soluble resin containing carboxylic acid in side chains, a compd. which produces acid by irradiation of active chemical rays, and a compd. having reactivity which decreases solubility in an alkaline soln. by acid catalyst reaction. As for the compd. which produces acid by active chemical rays, various kinds of diazonium salts, onium salts, esters of alkyl sulfonic acid and compds. containing plural phenol-type hydroxyl groups, and various halogen compds, can be used. The compd. having reactivity which decreases soubility in an alkaline soln. by acid catalyst reaction is preferably a deriv. of aliphatic hydrocarbon compd. having at least one alcohol-type hydroxyl group.


Inventors:
TSUCHIYA HIROKO
HATTORI KOJI
SHIRAISHI HIROSHI
YAMANAKA RYOKO
HATTORI KEIKO
Application Number:
JP9183997A
Publication Date:
October 23, 1998
Filing Date:
April 10, 1997
Export Citation:
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Assignee:
HITACHI LTD
International Classes:
G03F7/004; G03F7/038; H01L21/027; (IPC1-7): G03F7/038; G03F7/004; H01L21/027
Attorney, Agent or Firm:
Ogawa Katsuo