Title:
PATTERNED MONOMOLECULAR FILM AND PREPARATION METHOD FOR FINE PATTERN
Document Type and Number:
Japanese Patent JP2006247823
Kind Code:
A
Abstract:
To provide a method for preparing patterning formation in a molecular order capable of being applied to an organic transistor or the like.
An organic monomolecular film is formed on a substrate and a pattern is formed on the monomolecular film by partially removing the monomolecular film by a tunnel current radiation using a scanning tunneling microscope probe as a means for giving external stimulus. A preparation method of the patterned monomolecular film is made to a main constitution.
Inventors:
KATO TAKUJI
TORII MASASHI
TORII MASASHI
Application Number:
JP2005072068A
Publication Date:
September 21, 2006
Filing Date:
March 14, 2005
Export Citation:
Assignee:
RICOH KK
International Classes:
B82B1/00; B82B3/00; H01L29/06
Domestic Patent References:
JPH10270413A | 1998-10-09 | |||
JPH10183336A | 1998-07-14 |
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