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Title:
PHASE SHIFT MASK
Document Type and Number:
Japanese Patent JPH05249653
Kind Code:
A
Abstract:

PURPOSE: To facilitate the transfer of patterns of the width broader than the width of dark lines generated by the interference of the transmitted light of a transmission region and a shifter region.

CONSTITUTION: The chromium-less phase shift mask having the transmission region 4 and shifter region 5 where the phases between the transmitted light beams shift by a half wavelength is constituted by providing a phase transition region 6 where the phase of the transmitted light changes monotonously and continuously between the transmission region 4 and the shifter region 5. The transmission region 4 and the shifter region 5 are formed as the projecting part region and recessed part region on the surface of the phase shift mask. The phase transition region 6 is so constituted that its surface is formed as a region consisting of slopes connecting the surfaces of the two regionss; the projecting part region and the recessed part region.


Inventors:
MIYAZAKI KAZUMI
Application Number:
JP5017692A
Publication Date:
September 28, 1993
Filing Date:
March 09, 1992
Export Citation:
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Assignee:
FUJITSU LTD
International Classes:
G03F1/34; G03F1/68; H01L21/027; (IPC1-7): G03F1/08; H01L21/027
Attorney, Agent or Firm:
Teiichi



 
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