Title:
PHASE SHIFT RETICLE DEFECT INSPECTION DEVICE
Document Type and Number:
Japanese Patent JPH05127365
Kind Code:
A
Abstract:
PURPOSE: To inspect a phase shift reticle for defects with good accuracy without transferring to a semiconductor substrate, using an actual transferring device and to realize the reduction in inspection work time and price.
CONSTITUTION: The desired pattern housed in a magnetic memory 1 is given bit map extension to form a 2-image signal. When light penetrates a phase shift reticle 6, an image is formed on an image detector 8 to become an image signal by a magnifying projection lens 7 having the same optical lens transferring property as that of an actual transferring device. After both image signals are given an image processing 9 and a dislocation correction 11, defects on the reticle is detected (12).
Inventors:
TAKEUCHI SUSUMU
Application Number:
JP28839791A
Publication Date:
May 25, 1993
Filing Date:
November 05, 1991
Export Citation:
Assignee:
MITSUBISHI ELECTRIC CORP
International Classes:
G03F1/30; G03F1/84; H01L21/027; (IPC1-7): G03F1/08; H01L21/027
Attorney, Agent or Firm:
Mamoru Takada (1 person outside)