Title:
PHOTO RESIST COATING UNIT
Document Type and Number:
Japanese Patent JPS5441675
Kind Code:
A
Abstract:
PURPOSE:To perform the manufacure of photo resist film with the condition having no dust, by incorporating each processing means such as cleaning, drying and photo resist coating of semiconductor substrate in one package.
Inventors:
SATOU NOBUO
MORI YOSHIHARU
MORI YOSHIHARU
Application Number:
JP10780677A
Publication Date:
April 03, 1979
Filing Date:
September 09, 1977
Export Citation:
Assignee:
HITACHI LTD
International Classes:
H01L21/027; H01L21/302; (IPC1-7): H01L21/302