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Patent Searching and Data


Title:
PHOTOETCHING METHOD
Document Type and Number:
Japanese Patent JPH0718471
Kind Code:
A
Abstract:

PURPOSE: To excellently etch a metallic sheet without the end of the sheet etched by an etchant and without the burrs and lumps of the etched metal being left in the etchant by protecting the end with an adhesive tape before etching.

CONSTITUTION: When a metallic sheet is etched, a photoresist 2 is applied on the metallic sheet 1, a photographic pattern 3 is exposed and developed, an adhesive tape 4 with an acidproof and water-resistant synthetic resin film as a substrate is stuck on the end of the sheet 1 not coated with the photoresist, the sheet is etched, then the tape 4 is released, and the photoresist 2 is released. The adhesive strength of the tape 4 is kept at 200-600g/24mm width when the tape is released from a stainless steel sheet at' an angle of 180°C.


Inventors:
SEN TAKUO
SAKAHARA MANABU
Application Number:
JP16446893A
Publication Date:
January 20, 1995
Filing Date:
July 02, 1993
Export Citation:
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Assignee:
SEKISUI CHEMICAL CO LTD
International Classes:
C09J7/02; C09J121/00; C09J133/00; C23F1/00; (IPC1-7): C23F1/00