Title:
PHOTOETCHING METHOD
Document Type and Number:
Japanese Patent JPS53141035
Kind Code:
A
Abstract:
PURPOSE: To facilitate the formation of fine patterns of high accuracy by forming negative type photosensitive resin patterns by making use of the positive type photosensitive resin patterns formed on a base.
Inventors:
OGAWA KAZUFUMI
Application Number:
JP5562777A
Publication Date:
December 08, 1978
Filing Date:
May 13, 1977
Export Citation:
Assignee:
MATSUSHITA ELECTRIC IND CO LTD
International Classes:
G03F7/20; G03F7/00; G03F7/095; H01L21/027; H05K3/06; (IPC1-7): G03C1/00; G03C5/00; G03F7/02; H01L21/302; H05K3/06