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Title:
PHOTOPOLYMERIZABLE COMPOSITION
Document Type and Number:
Japanese Patent JP3406233
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To provide the photopolymerizable composition superior in sensitivity and resolution and adhesion with a substrate and etching releasability, too, by using one of salicylic acid ester and phthalic acid diester each having a specified number of functional groups for a photopolymerizable monomer.
SOLUTION: The photopolymerizable composition comprises a polymer binder and a photopolymerization initiator and the photopolymerizable monomer, i.e., the salicylic acid ester or phthalic acid diester each having 1-5 functional groups represented by the formula. Where R1 is a 2-5C alkyl (optionally substituted by a halogen atom or a hydroxyl group or a 1-5C alkyl group or a 1-5C alkoxy group or the like) or a -CH2O- group; (n) is an integer of 2-10; and R2 is an H atom or a 1-5C alkyl group optionally substituted by a hydroxyl group.


Inventors:
Shinichiro Ishino
Kinnori Oshio
Hiroyuki Obiya
Application Number:
JP34098298A
Publication Date:
May 12, 2003
Filing Date:
November 13, 1998
Export Citation:
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Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
G03F7/027; G03F7/028; G03F7/032; G03F7/033; (IPC1-7): G03F7/027; G03F7/032
Domestic Patent References:
JP9118708A
JP2161438A
JP529091A
JP756338A
JP7333846A
JP8123016A
JP6148881A
JP7248627A
JP728238A
JP8262700A
JP60254033A
JP216563A
Attorney, Agent or Firm:
Heihachi Hattori



 
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