Title:
PHOTOPOLYMERIZABLE POLYSILANE COMPOUND AND ITS PRODUCTION METHOD
Document Type and Number:
Japanese Patent JP3883453
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a novel photopolymerizable polysilane compound which has both photosensitivity and high transparency, and enables pattern formation of high accuracy having a high refractive index and good stability.
SOLUTION: The photopolymerizable polysilane compound has at least two photopolymerizable double bond-containing groups in the molecule. Preferably, the compound is a polymer or an oligomer having at least one of the repeating units to be represented by formulae (1) and (2) (wherein R1 and R2 are each independently a hydrogen atom or a photopolymerizable double bond-containing group; and R3 is an alkyl group or an aryl group).
Inventors:
Tsuyoshi Fujiki
Hiroaki Murase
Hironori Sakamoto
Shinichi Kawasaki
Satoru Fujii
Takayuki Morita
Kei Kitano
Hiroaki Murase
Hironori Sakamoto
Shinichi Kawasaki
Satoru Fujii
Takayuki Morita
Kei Kitano
Application Number:
JP2002061686A
Publication Date:
February 21, 2007
Filing Date:
March 07, 2002
Export Citation:
Assignee:
OSAKA GAS CO.,LTD.
Nagase Chemtex Co., Ltd.
Nagase Chemtex Co., Ltd.
International Classes:
C08F299/02; C08G77/60; C08L83/16; C09D183/16; (IPC1-7): C08G77/60; C08F299/02
Domestic Patent References:
| JP62190229A | ||||
| JP4174858A | ||||
| JP9324053A | ||||
| JP2001316475A | ||||
| JP8305028A | ||||
| JP8113650A | ||||
| JP3063285A | ||||
| JP6192429A | ||||
| JP6057002A | ||||
| JP7033881A |
Other References:
Journal of Organometallic Chemistry,402[3], 1991,C45-C49
Attorney, Agent or Firm:
Hiromichi Nanjo