Title:
ホトレジスト組成物、該ホトレジスト組成物用低分子化合物および高分子化合物
Document Type and Number:
Japanese Patent JP4386710
Kind Code:
B2
Abstract:
A high-molecular compound and a low-molecular compound or both having an alkali-soluble site (i) wherein at least a part of the alkali-soluble site (i) is protected with (ii) a halogen atom-containing acetal type acid-dissociative, dissolution inhibiting group, as well as a photoresist composition comprising the same. The photoresist composition is highly stable during storage and can give a resist pattern excellent in sectional rectangular shape and having high transparency to an exposure light, particularly a light having a wavelength of 300 nm or less.
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Inventors:
Toshiyuki Ogata
Kotaro Endo
Hiromitsu Tsuji
Masaaki Yoshida
Mitsuru Sato
Shogo Matsumaru
Hideo Haneda
Kotaro Endo
Hiromitsu Tsuji
Masaaki Yoshida
Mitsuru Sato
Shogo Matsumaru
Hideo Haneda
Application Number:
JP2003391139A
Publication Date:
December 16, 2009
Filing Date:
November 20, 2003
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
G03F7/039; C07C43/12; C07C43/162; C07C43/174; C07C69/96; C08F8/00; G03F7/004; G03F7/075; H01L21/027
Domestic Patent References:
| JP2003015301A | ||||
| JP2003252928A | ||||
| JP2003089708A | ||||
| JP2003057826A | ||||
| JP2003015300A | ||||
| JP2002338634A | ||||
| JP2002201219A | ||||
| JP2002145962A | ||||
| JP2002091001A | ||||
| JP2002053618A |
Attorney, Agent or Firm:
Masayuki Masabayashi