Title:
PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE COMPOSITION FOR BLUE-VIOLET LASER, IMAGE-FORMING BASE MATERIAL USING THE SAME, IMAGE-FORMING MATERIAL AND IMAGE-FORMING METHOD
Document Type and Number:
Japanese Patent JP2007041493
Kind Code:
A
Abstract:
To provide a photosensitive composition which is highly sensitive to laser light, particularly to laser light from ultraviolet to blue-violet, and is excellent in long-term storage stability and adhesion to a substrate, wherein the photosensitive composition is suitably used as a solder resist or a dry film, and in particular it is suitable for direct drawing using laser light from ultraviolet to blue-violet.
The photosensitive composition contains (A) an ethylenically unsaturated group-containing compound, (B) a photopolymerization initiator and (C) an alkali-soluble resin, wherein the photopolymerization initiator (B) contains a photopolymerization initiator having a specific structure and an average particle diameter of 0.001-150 μm.
Inventors:
URANO TOSHIYOSHI
KAMEYAMA YASUHIRO
MIZUKAMI JUNJI
KAMEYAMA YASUHIRO
MIZUKAMI JUNJI
Application Number:
JP2005305074A
Publication Date:
February 15, 2007
Filing Date:
October 19, 2005
Export Citation:
Assignee:
MITSUBISHI CHEM CORP
International Classes:
G03F7/031; C08F2/50; G03F7/004; G03F7/033
Attorney, Agent or Firm:
Hasegawa Soji