To provide a photosensitive resin relief printing plate precursor which excels in highlight print reproducibility and can be produced at a low manufacturing cost.

(1) The photosensitive resin relief printing plate precursor is for obtaining a photosensitive resin relief printing plate by a plate making process, by using a negative film for the photosensitive resin relief printing plate precursor comprising at least a support, an adhesive layer, a photosensitive resin layer, an antiadhesive layer and a cover film, wherein 5% or lower of highlight dots of a printing plate obtained after the plate making process have an area reproduction ratio of 90% or lower relative to the negative film. (2) The photosensitive resin relief printing plate precursor in (1) is obtained from a photosensitive resin composition in which the concentration of crosslinking groups is 1.0-1.5 mmol/g. (3) The photosensitive resin relief printing plate precursor in (1) or (2) is such that a soluble synthetic high molecular compound in the photosensitive resin composition is a polyether urea urethane, having a polyether bond, a urethane bond and a urea bond. (4) The photosensitive resin relief printing plate precursor in (1) or (2) is such that the soluble synthetic high molecular compound in the photosensitive resin composition is a polyamide, having a polyether bond and an amide bond and contains 40-60 mass% of a 6-nylon and/or 6-6 nylon component. (5) The photosensitive resin relief printing plate precursor in (1) or (2) is such that the soluble synthetic high-molecular compound in the photosensitive resin composition is a partially saponified vinyl acetate having a saponification degree of 85-98%.