Title:
PHOTOSENSITIVE SILOXANE COMPOSITION, CURED FILM FORMED FROM THE SAME AND ELEMENT HAVING CURED FILM
Document Type and Number:
Japanese Patent JP2008020898
Kind Code:
A
Abstract:
To provide a photosensitive siloxane composition having high resolution, high heat resistance and high transparency after a heat curing step and excellent adhesiveness after alkali treatment, a cured film formed from the same and an element having the cured film.
The photosensitive siloxane composition comprises (a) polysiloxane, (b) a quinonediazide compound, (c) a solvent and (d) a heat radical generator having a 10-hour half-life temperature of 90-160C.
Inventors:
ARAKI HITOSHI
SENOO MASAHIDE
SUWA MITSUFUMI
SENOO MASAHIDE
SUWA MITSUFUMI
Application Number:
JP2007154801A
Publication Date:
January 31, 2008
Filing Date:
June 12, 2007
Export Citation:
Assignee:
TORAY INDUSTRIES
International Classes:
G03F7/023; C08F299/08; G03F7/004; G03F7/037; G03F7/075; H01L51/50; H05B33/22; C08G77/04