Title:
PHOTOSENSITIVE TRANSFER MATERIAL, METHOD FOR FORMING RESIN PATTERN, SUBSTRATE WITH RESIN PATTERN, DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE
Document Type and Number:
Japanese Patent JP2010060841
Kind Code:
A
Abstract:
To provide a photosensitive transfer material excellent in peeling properties of a cover film in which contamination of a cutter is suppressed in cutting a cover film.
The photosensitive transfer material comprises a temporary support body, a thermoplastic resin layer the hardness of which is 1.0 to 4.5 when measured by a triangular pyramid indenter with a load of 0.5 mN, a photosensitive resin layer, and a cover film in this order.
Inventors:
GOTO HIDENORI
YOSHINARI SHINICHI
YOSHINARI SHINICHI
Application Number:
JP2008226366A
Publication Date:
March 18, 2010
Filing Date:
September 03, 2008
Export Citation:
Assignee:
FUJIFILM CORP
International Classes:
G03F7/11; G02B5/20; G03F7/004; G03F7/26
Attorney, Agent or Firm:
Atsushi Nakajima
Kato Kazunori
Katsuichi Nishimoto
Hiroshi Fukuda
Kato Kazunori
Katsuichi Nishimoto
Hiroshi Fukuda