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Patent Searching and Data


Title:
PIEZOELECTRIC DEVICE SUBSTRATE
Document Type and Number:
Japanese Patent JPH0794800
Kind Code:
A
Abstract:

PURPOSE: To facilitate the compatibility with a radio frequency surface acoustic wave by a method wherein a multilayer structure piezoelectric device substrate on which a piezoelectric IV-V compound film and a piezoelectric composite oxide film are formed is employed to make the speed of the elastic surface wave, an electromechanical coupling constant, etc. have specific values.

CONSTITUTION: A piezoelectric IV-V compound film is formed on a substrate and, further, a composite oxide film which is made of at least 3 types of elements is formed on it. The substrate is made of sapphire or glass. An aluminum nitride film or a GaAs film is used as the piezoelectric IV-V compound film. A lithium niobate film is used as the composite oxide film. The speed of the surface acoustic wave, the electromechanical coupling constant and the absolute value of the temperature coefficient of the central frequency of the piezoelectric device substrate are predetermined to be not less than 5000m/s, not less than 1% and not larger than 30ppm/°C respectively. For that purpose, the thickness of the piezoelectric TV-V compound film is predetermined to be 0.001-15μm and the thickness of the piezoelectric composite oxide film is predetermined to be 0.01-10μm.


Inventors:
SHIBATA YOSHIHIKO
KAYA TATSUYOSHI
Application Number:
JP23642493A
Publication Date:
April 07, 1995
Filing Date:
September 22, 1993
Export Citation:
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Assignee:
ASAHI CHEMICAL IND
International Classes:
H01L41/18; H03H9/25; (IPC1-7): H01L41/18; H03H9/25
Attorney, Agent or Firm:
Hidetake Komatsu (2 outside)