Title:
PLASMA ETCHING METHOD
Document Type and Number:
Japanese Patent JPS5349398
Kind Code:
A
Abstract:
PURPOSE: To shorten the cooling time of a reaction container by introducing cooling gas to the container when an electric signal is supplied or stopped in a plasma etching method for controlling by detecting the temperature in the container for containing etching gas.
Inventors:
YANAGIDA KENZOU
YAMAGISHI FUMIO
ISHIZUKA TOSHIHIRO
YAMAGISHI FUMIO
ISHIZUKA TOSHIHIRO
Application Number:
JP12350476A
Publication Date:
May 04, 1978
Filing Date:
October 15, 1976
Export Citation:
Assignee:
FUJITSU LTD
International Classes:
H01J37/30; (IPC1-7): B26F1/30; H01J37/30