Title:
Plasma gas generating device
Document Type and Number:
Japanese Patent JP6255590
Kind Code:
B2
Abstract:
The present invention aims to provide a plasma generation device including: a plasma generation part which generates plasma; diluent gas supply means which supplies a diluent gas for diluting the plasma generated by the plasma generation part; and a spray port through which a plasma gas resulting from the dilution of the plasma with the diluent gas is sprayed, in which the characteristics of the plasma gas are changed and controlled so as to enlarge the plasma gas and enhance the activity of the plasma gas, without controlling the power input from a power source to the plasma generation part. The plasma generation device of the present invention includes an electromagnetic wave production device which irradiates at least one of a region where the plasma is generated and a region where the plasma gas passes with an electromagnetic wave from an antenna.
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Inventors:
Yuji Ikeda
Application Number:
JP2013551734A
Publication Date:
January 10, 2018
Filing Date:
December 26, 2012
Export Citation:
Assignee:
Imagineering Co., Ltd.
International Classes:
H05H1/24; H05H1/30; H05H1/46
Domestic Patent References:
| JP2005196980A | ||||
| JP2005340079A | ||||
| JP2007299720A | ||||
| JP2004111948A | ||||
| JP2009036199A | ||||
| JP2008508683A | ||||
| JP2009034674A | ||||
| JP62086700A | ||||
| JP2002008894A |
Foreign References:
| WO2010082561A1 | ||||
| WO2011034190A1 | ||||
| WO2011034189A1 |