Title:
PLASMA PROCESSING DEVICE, INSPECTION METHOD USING PLASMA PROCESSING DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING PLASMA PROCESSING DEVICE
Document Type and Number:
Japanese Patent JP2020187948
Kind Code:
A
Abstract:
To detect a minute change in a state of plasma.SOLUTION: A plasma processing apparatus PTD1 includes: a chamber 10; and an electrostatic chuck provided inside the chamber 10. A probe PL for detecting a potential of the plasma is attached to the chamber 10 so as to be separated from the electrostatic chuck. The probe PL includes: a rod-shaped conductive member CP; and a cylindrical dielectric member DP covering the conductive member CP. With such the probe PL, a small change in a state of the plasma generated inside the chamber 10 can be detected.SELECTED DRAWING: Figure 2
Inventors:
FUJII KAZUYUKI
INOUE YOSUKE
INOUE YOSUKE
Application Number:
JP2019092614A
Publication Date:
November 19, 2020
Filing Date:
May 16, 2019
Export Citation:
Assignee:
RENESAS ELECTRONICS CORP
International Classes:
H05H1/00; C23C16/52; H01L21/205; H01L21/3065; H01L21/31; H05H1/46
Domestic Patent References:
| JP2013187156A | 2013-09-19 | |||
| JP2005203124A | 2005-07-28 | |||
| JP2000299173A | 2000-10-24 |
Attorney, Agent or Firm:
Tsutsui International Patent Office