Title:
PLASMA PROCESSING METHOD AND PLASMA PROCESSOR
Document Type and Number:
Japanese Patent JP3204836
Kind Code:
B2
Abstract:
PURPOSE: To stabilize the start of plasma by introducing inert gas into a processing container and producing plasma precedently by means of an induction means, and introducing processing gas for an object to be processed into the processing container, and producing plasma by means of the induction means.
CONSTITUTION: Inert gas such as Ar or the like is introduced from a shower head 19 arranged opposite to an object 2 to be processed. The pressure inside a container 1 is set to be specified pressure, for example 1⊗10-2Torr by the control of an exhaust means 17 and a valve 15. Next, plasma is produced for several seconds within a processing container where high frequency voltage, for example, 13.56MHz is applied by a high frequency power source 31. By producing plasma precedently by inert gas in this way, the plasma of the gas to process the objected to be processed can be started and stabilized easily, so the processing of the object 1 for processing by plasma can be stabilized.
Inventors:
Nobuo Ishii
Application Number:
JP7972694A
Publication Date:
September 04, 2001
Filing Date:
March 25, 1994
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H05H1/46; C23F4/00; H01L21/302; H01L21/3065; H01L21/31; H01L21/68; H01L21/683; (IPC1-7): H01L21/3065; C23F4/00; H05H1/46
Domestic Patent References:
| JP7183097A | ||||
| JP379025A | ||||
| JP1125933A | ||||
| JP56121632A | ||||
| JP627130A | ||||
| JP5217693A | ||||
| JP1146327A |
Attorney, Agent or Firm:
Toshio Inoue