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Title:
PLASMA PRODUCING METHOD IN PLASMA-PROCESS WASTE GAS PURIFYING DEVICE
Document Type and Number:
Japanese Patent JPH07265654
Kind Code:
A
Abstract:

PURPOSE: To prevent the formation of a conductive bridge and to precisely and rapidly design a plasma-process waste gas purifying device by quantitatively expressing a relation between the pulse duration and the interelectrode distance and continuously impressing a high-voltage pulse between the electrodes closest to each other.

CONSTITUTION: A high-voltage pulse power source 1 for producing plasma, a wire-type discharge electrode 2 and a plate-type counter electrode 3 are provided to the device. A high-voltage pulse is continuously impressed between the electrode 2 and 3 to produce non-equilibrium plasma 4 between the electrodes 2 and 3. A waste gas 5 to be treated is passed between the electrodes 2 and 3 and converted to the form easy to collect harmful components or to the harmless form. In this case, the shortest distance d (cm) between the electrodes 2 and 3 and the high-voltage pulse duration Ton (sec) are limited to conform to Ton≤d/108.


Inventors:
MAEHATA HIDEHIKO
ARAI HIROSHIGE
INOUE TETSUYA
YASUDA KENJI
Application Number:
JP6346294A
Publication Date:
October 17, 1995
Filing Date:
March 31, 1994
Export Citation:
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Assignee:
HITACHI SHIPBUILDING ENG CO
International Classes:
H05H1/24; B01D53/32; B01D53/50; B01D53/56; B01D53/60; B01D53/74; B01D53/81; (IPC1-7): B01D53/32; B01D53/50; B01D53/56; B01D53/60; B01D53/74; B01D53/81; H05H1/24
Attorney, Agent or Firm:
Eisuke Kishimoto (3 others)



 
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