Title:
PLASMA RESISTANT CERAMIC MEMBER
Document Type and Number:
Japanese Patent JP2007326744
Kind Code:
A
Abstract:
To provide a plasma resistant ceramic member having excellent corrosion resistance against a halogen-based corrosive gas and plasma thereof and easily controllable electrical resistivity and being suitably used as a semiconductor, a liqud crystal manufacture apparatus or the like, particularly a member for a plasma processing apparatus such as an electrostatic chuck.
An yttria thermally sprayed film having ≤5% porosity and ≥99.9% purity is formed on the outermost surface of an yttria ceramic sintered compact containing tungsten dispersed by ≥2.5 vol.% and ≤25 vol.% to yttria and having ≤0.1% open porosity.
COPYRIGHT: (C)2008,JPO&INPIT
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Inventors:
WATANABE KEISUKE
MORITA TAKASHI
NAGASAKA SACHIYUKI
MURATA MASATAKA
KUBO TAKAHIRO
MORITA TAKASHI
NAGASAKA SACHIYUKI
MURATA MASATAKA
KUBO TAKAHIRO
Application Number:
JP2006159557A
Publication Date:
December 20, 2007
Filing Date:
June 08, 2006
Export Citation:
Assignee:
COVALENT MATERIALS CORP
International Classes:
C04B35/50; C04B41/87; H01L21/3065; H01L21/31
Attorney, Agent or Firm:
Kinoshita Shigeru