Title:
PLASMA TREATMENT METHOD AND APPARATUS
Document Type and Number:
Japanese Patent JP3948296
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a plasma treatment method and a plasma treatment apparatus that prevent dust and cracks of an antenna cover from being generated easily.
SOLUTION: Specific gas is introduced into a vacuum vessel 1 from a gas supply apparatus 2, at the same time, evacuation is made by a pump 3 used as an evacuation apparatus, and 100 MHz high-frequency power is supplied to an antenna 5 projecting in the vacuum vessel 1 by a high-frequency power supply 4 for antenna while specific pressure is maintained in the vacuum vessel 1, thus generating plasma in the vacuum vessel 1. When a substrate 7 with an indium film is subjected to etching, 500 kHz high-frequency power is supplied to the antenna by a high-frequency power supply 19 for self biasing, thus preventing a conductive deposited film from adhering to an antenna cover 15.
Inventors:
Tomohiro Okumura
Yukihiro Maekawa
Hiroyuki Suzuki
Yukihiro Maekawa
Hiroyuki Suzuki
Application Number:
JP2002029232A
Publication Date:
July 25, 2007
Filing Date:
February 06, 2002
Export Citation:
Assignee:
Matsushita Electric Industrial Co., Ltd
International Classes:
H01L21/3065; H05H1/46; (IPC1-7): H01L21/3065; H05H1/46
Domestic Patent References:
| JP2001250815A | ||||
| JP2002009054A | ||||
| JP2002009055A | ||||
| JP2001057363A | ||||
| JP2001267297A | ||||
| JP11354510A | ||||
| JP2000195846A | ||||
| JP2001077090A | ||||
| JP9063793A |
Attorney, Agent or Firm:
Fumio Iwahashi
Hiroki Naito
Daisuke Nagano
Hiroki Naito
Daisuke Nagano