Title:
研磨用組成物、およびそれを用いてメモリーハードディスクを研磨する研磨方法
Document Type and Number:
Japanese Patent JP4009986
Kind Code:
B2
Abstract:
A polishing composition for a substrate to be used for a memory hard disk, which comprises the following components (a) to (d):(a) water,(b) at least one compound selected from the group consisting of a polyoxyethylene polyoxypropylene alkyl ether and a polyoxyethylene polyoxypropylene copolymer,(c) at least one compound selected from the group consisting of nitric acid, nitrous acid, sulfuric acid, hydrochloric acid, molybdic acid, sulfamic acid, glycine, glyceric acid, mandelic acid, malonic acid, ascorbic acid, glutamic acid, glyoxylic acid, malic acid, glycolic acid, lactic acid, gluconic acid, succinic acid, tartaric acid, maleic acid and citric acid, and their salts, and(d) at least one abrasive selected from the group consisting of aluminum oxide, silicon dioxide, cerium oxide, zirconium oxide, titanium oxide, silicon nitride and silicon carbide.
Inventors:
Hirohisa Sugiyama
Tomoaki Ishibashi
Toshiyuki Takahashi
Tomoaki Ishibashi
Toshiyuki Takahashi
Application Number:
JP2000362739A
Publication Date:
November 21, 2007
Filing Date:
November 29, 2000
Export Citation:
Assignee:
Fujimi Incorporated Co., Ltd.
International Classes:
C09K3/14; B24B37/00; C09G1/02; C09K13/04; C09K13/06; G11B5/84
Domestic Patent References:
| JP200015560A | ||||
| JP1036818A | ||||
| JP11209746A | ||||
| JP10245545A | ||||
| JP10204419A | ||||
| JP10204416A | ||||
| JP11228939A | ||||
| JP200063805A | ||||
| JP9256171A | ||||
| JP5311153A | ||||
| JP7216345A | ||||
| JP1088112A | ||||
| JP1121545A | ||||
| JP2000273445A |
Attorney, Agent or Firm:
Hisao Kobayashi
Souji Sasaki
Saburo Kimura
Noboru Omura
Souji Sasaki
Saburo Kimura
Noboru Omura