Title:
POLISHING MATERIAL
Document Type and Number:
Japanese Patent JP3865143
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain a polishing material exhibiting an antistatic performance over a long period, not staining polishing machines, and useful for polishing the surfaces of coins, medals, etc., for removing the burrs of semiconductor- sealing materials, for removing stains from glass plates, for treating the surfaces of lightweight metals, etc.
SOLUTION: (A) Synthetic resin polishing particles formed from a polymer alloy comprising 6-nylon and ultrahigh mol.wt. polyethylene especially having an intrinsic viscosity of 10-30dl/g in a ratio of 93/7 to 30/70, and (B) a pyrrole compound monomer such as pyrrole, 3-methylpyrrole, N-methylpyrrole or 3,4- dimethylpyrrole are preferably subjected to a contact polymerization treatment in the presence of an oxidative polymerization agent to obtain the integrated composite material as a polishing material. The oxidative polymerization agent is preferably ferric chloride, ferric p-toluenesulfonate, etc.
Inventors:
Ikuo Mizoguchi
Application Number:
JP19255695A
Publication Date:
January 10, 2007
Filing Date:
July 05, 1995
Export Citation:
Assignee:
Achilles Corporation
International Classes:
A63F7/02; C09K3/14; B24B31/14; C08J3/12; C08J5/14; (IPC1-7): C09K3/14; B24B31/14; C08J3/12; C08J5/14; //A63F7/02; C08L23:04
Domestic Patent References:
| JP6362666A | ||||
| JP1188262A | ||||
| JP59201754A | ||||
| JP6259082U | ||||
| JP6310685A |
Attorney, Agent or Firm:
Isamu Hosoi