To provide a method for conveniently and productively manufacturing a polishing pad which is equipped with an anode, has superior flattening property and high polishing speed and, and suppresses the occurrence of scratches.
The polishing pad manufacturing method includes the steps of: manufacturing a laminated sheet by laminating a resin layer 13 on one surface of a tin sheet 11 having at least one protruded portion 21 for the anode; forming a plurality of through-holes A17 penetrating the tin sheet 11 and the resin layer 13 to a part excluding the protruded part 21 for the anode of the laminated sheet; forming a resin region X including a polyurethane resin between the through-holes A17 and the tin sheet 11; and forming a resin region Z15 including the polyurethan resin on the tin sheet 11.
OGA TAKASHI
MARUYAMA SATOSHI
SHIMIZU SHINJI
NAKAJIMA SACHIKO