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Title:
POLISHING WORK METHOD AND DEVICE THEREOF
Document Type and Number:
Japanese Patent JPH04159074
Kind Code:
A
Abstract:

PURPOSE: To sharply reduce the occurrence of a trouble, such as breakage of the side plate of a polishing tank, by locating a polishing tank support rotary shaft along the direction of length in a manner to extend through the polishing tank.

CONSTITUTION: A polishing tank support rotary shaft 3 is extended through the central part of a polishing tank 4 or along the direction of the length of the polishing tank. Thereby, abundant load resistance is provided and a further more quantities of polishing materials and works can be contained. When the polishing tank support rotary shaft 3 is extended directly through a turret drum, a single or a plurality of the polishing tanks having various sizes are mounted to the periphery or the surroundings of the polishing tank support rotary shaft 3 and can be rotated, resulting in improvement of productivity and economical efficiency.


Inventors:
ONO IETATSU
Application Number:
JP28194690A
Publication Date:
June 02, 1992
Filing Date:
October 22, 1990
Export Citation:
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Assignee:
ONO IETATSU
International Classes:
B24B31/033; (IPC1-7): B24B31/033



 
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