To easily produce a polyimide optical waver plate having excellent reliability against heat by uniaxially stretching a polyimide film while heating, in a method for the production of a polyimide optical wave plate including a process of uniaxially stretching a polyimide film.
First, a polar solution of a polyamide acid prepared from a tetracarboxylic acid or its derivative and diamine is applied on a proper substrate such as a silicon wafer by a spin coating method or the like, and heated to a specified temp. to perform thermal imidization. The atmosphere during the thermal imidization is not especially limited, but the process is preferably performed in an inert gas atmosphere such as nitrogen. Then the film is peeled from the substrate to produce a polyimide film, which is then uniaxially stretched to control the retardation while heating to produce the polyimide optical wave plate. The heating temperature in the uniaxial stretching process is preferably ≥100°C and lower than the glass transition temperature of the polyimide.
SASAKI SHIGEKUNI
KATADA KUMIKO
IWAZAWA AKIRA
MATSUURA TORU
NTT ADVANCED TECH KK
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