Title:
POLYORGANOSILSESQUIOXANE AND ITS PRODUCTION
Document Type and Number:
Japanese Patent JP3272002
Kind Code:
B2
Abstract:
PURPOSE: To obtain a polyorganosilsesquioxane having ultra-high-molecular weight, providing a coating film having excellent toughness, hardness and heat resistance without curing under heating.
CONSTITUTION: An initial hydrolyzate condensate of a trialkoxysilane or trichlorosilane is heated in an organic solvent (e.g. methanol or ethanol) in 0.5-30wt.% solid content concentration by using an alkali (e.g. sodium hydroxide) as a catalyst at 60-140°C and condensed to produce a polyorganosilsesquioxane of the formula [50-100mol % whole side chain R1 is methyl group and the rest is 2 or 3C alkyl or (substituted) phenyl; R2 is 1-3C alkyl or H; (n) is integer], having ≥100,000 number-average molecular weight.
Inventors:
Fumio Matsui
Youichi Nanba
Nobuyuki Kaneko
Youichi Nanba
Nobuyuki Kaneko
Application Number:
JP22189891A
Publication Date:
April 08, 2002
Filing Date:
September 02, 1991
Export Citation:
Assignee:
SHOWA DENKO K.K.
International Classes:
C08G77/04; C08G77/06; (IPC1-7): C08G77/06
Domestic Patent References:
| JP5813632A | ||||
| JP320331A | ||||
| JP5649540A | ||||
| JP61108628A |
Attorney, Agent or Firm:
Masatake Shiga (2 outside)
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