Title:
POLYVINYL ACETAL RESIN FOR HEAT DEVELOPING PHOTOSENSITIVE MATERIAL AND HEAT DEVELOPING PHOTOSENSITIVE MATERIAL
Document Type and Number:
Japanese Patent JP3670970
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a polyvinyl acetal resin for a heat developing photosensitive material having excellent image properties without causing poor pot life of a coating solution, discoloration of the heat developing photosensitive material, fogging, poor gradation, and poor sensitivity of images, poor storage stability of green films and the like, and a heat developing photosensitive material.
SOLUTION: The polyvinyl acetal resin for a heat developing photosensitive material is synthesized by the acetalization reaction of a polyvinyl alcohol with an aldehyde, has a degree of polymerization of 200-3,000, a ratio of the residual acetyl group of 0-25 mol% when an acetal group is counted as two acetalized hydroxy groups, a ratio of the residual hydroxy group of 17-35 mol%, a water content of ≤2.5 wt.%, a residual aldehyde content of ≤10 ppm and contains no antioxidant.
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Inventors:
Yoshitaka Miyake
Application Number:
JP2001012016A
Publication Date:
July 13, 2005
Filing Date:
January 19, 2001
Export Citation:
Assignee:
Sekisui Chemical Co.,Ltd.
International Classes:
G03F7/033; C08F8/28; C08L29/14; G03C1/498; G03F7/26; (IPC1-7): G03C1/498; C08L29/14
Domestic Patent References:
| JP3023462A | ||||
| JP11349630A | ||||
| JP6228227A | ||||
| JP8048567A | ||||
| JP10045835A | ||||
| JP2000235243A |
Attorney, Agent or Firm:
Yasuo Yasutomi